From Unregulated Networks to Designed Microstructures: Introducing Heterogeneity at Different Length Scales in Photopolymers for Additive Manufacturing.


Journal

Chemical reviews
ISSN: 1520-6890
Titre abrégé: Chem Rev
Pays: United States
ID NLM: 2985134R

Informations de publication

Date de publication:
28 Mar 2024
Historique:
medline: 28 3 2024
pubmed: 28 3 2024
entrez: 28 3 2024
Statut: aheadofprint

Résumé

Photopolymers have been optimized as protective and decorative coating materials for decades. However, with the rise of additive manufacturing technologies, vat photopolymerization has unlocked the use of photopolymers for three-dimensional objects with new material requirements. Thus, the originally highly cross-linked, amorphous architecture of photopolymers cannot match the expectations for modern materials anymore, revealing the largely unanswered question of how diverse properties can be achieved in photopolymers. Herein, we review how microstructural features in soft matter materials should be designed and implemented to obtain high performance materials. We then translate these findings into chemical design suggestions for enhanced printable photopolymers. Based on this analysis, we have found microstructural heterogenization to be the most powerful tool to tune photopolymer performance. By combining the chemical toolbox for photopolymerization and the analytical toolbox for microstructural characterization, we examine current strategies for physical heterogenization (fillers, inkjet printing) and chemical heterogenization (semicrystalline polymers, block copolymers, interpenetrating networks, photopolymerization induced phase separation) of photopolymers and put them into a material scientific context to develop a roadmap for improving and diversifying photopolymers' performance.

Identifiants

pubmed: 38546847
doi: 10.1021/acs.chemrev.3c00570
doi:

Types de publication

Journal Article Review

Langues

eng

Sous-ensembles de citation

IM

Auteurs

Mojtaba Ahmadi (M)

Institute of Materials Science and Technology, Technische Universität Wien, Getreidemarkt 9BE, 1060 Vienna, Austria.

Katharina Ehrmann (K)

Institute of Applied Synthetic Chemistry, Technische Universität Wien, Getreidemarkt 9/163, 1060 Vienna, Austria.

Thomas Koch (T)

Institute of Materials Science and Technology, Technische Universität Wien, Getreidemarkt 9BE, 1060 Vienna, Austria.

Robert Liska (R)

Institute of Applied Synthetic Chemistry, Technische Universität Wien, Getreidemarkt 9/163, 1060 Vienna, Austria.

Jürgen Stampfl (J)

Institute of Materials Science and Technology, Technische Universität Wien, Getreidemarkt 9BE, 1060 Vienna, Austria.

Classifications MeSH