High-κ Wide-Gap Layered Dielectric for Two-Dimensional van der Waals Heterostructures.

crystal synthesis dielectric excitons field-effect transistors heterostructures high-k two-dimensional materials

Journal

ACS nano
ISSN: 1936-086X
Titre abrégé: ACS Nano
Pays: United States
ID NLM: 101313589

Informations de publication

Date de publication:
16 Apr 2024
Historique:
medline: 1 4 2024
pubmed: 1 4 2024
entrez: 1 4 2024
Statut: ppublish

Résumé

van der Waals heterostructures of two-dimensional materials have unveiled frontiers in condensed matter physics, unlocking unexplored possibilities in electronic and photonic device applications. However, the investigation of wide-gap, high-κ layered dielectrics for devices based on van der Waals structures has been relatively limited. In this work, we demonstrate an easily reproducible synthesis method for the rare-earth oxyhalide LaOBr, and we exfoliate it as a 2D layered material with a measured static dielectric constant of 9 and a wide bandgap of 5.3 eV. Furthermore, our research demonstrates that LaOBr can be used as a high-κ dielectric in van der Waals field-effect transistors with high performance and low interface defect concentrations. Additionally, it proves to be an attractive choice for electrical gating in excitonic devices based on 2D materials. Our work demonstrates the versatile realization and functionality of 2D systems with wide-gap and high-κ van der Waals dielectric environments.

Identifiants

pubmed: 38557003
doi: 10.1021/acsnano.3c10411
pmc: PMC11025129
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

10397-10406

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Auteurs

Aljoscha Söll (A)

Department of Inorganic Chemistry, University of Chemistry and Technology Prague, Technicka 5, 166 28, Prague 6, Czech Republic.

Edoardo Lopriore (E)

Institute of Electrical and Microengineering, École Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland.
Institute of Materials Science and Engineering, École Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland.

Asmund Ottesen (A)

Institute of Electrical and Microengineering, École Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland.
Institute of Materials Science and Engineering, École Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland.

Jan Luxa (J)

Department of Inorganic Chemistry, University of Chemistry and Technology Prague, Technicka 5, 166 28, Prague 6, Czech Republic.

Gabriele Pasquale (G)

Institute of Electrical and Microengineering, École Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland.
Institute of Materials Science and Engineering, École Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland.

Jiri Sturala (J)

Department of Inorganic Chemistry, University of Chemistry and Technology Prague, Technicka 5, 166 28, Prague 6, Czech Republic.

František Hájek (F)

Institute of Physics of the Czech Academy of Sciences, v.v.i., Cukrovarnická 10, 162 00, Prague 6, Czech Republic.

Vítězslav Jarý (V)

Institute of Physics of the Czech Academy of Sciences, v.v.i., Cukrovarnická 10, 162 00, Prague 6, Czech Republic.

David Sedmidubský (D)

Department of Inorganic Chemistry, University of Chemistry and Technology Prague, Technicka 5, 166 28, Prague 6, Czech Republic.

Kseniia Mosina (K)

Department of Inorganic Chemistry, University of Chemistry and Technology Prague, Technicka 5, 166 28, Prague 6, Czech Republic.

Igor Sokolović (I)

Institute of Microelectronics, TU Wien, Gußhausstraße 27-29, 1040 Vienna, Austria.
Institute of Applied Physics, TU Wien, Wiedner Hauptstraße 8-10, 1040 Vienna, Austria.

Saeed Rasouli (S)

Institute of Applied Physics, TU Wien, Wiedner Hauptstraße 8-10, 1040 Vienna, Austria.

Tibor Grasser (T)

Institute of Microelectronics, TU Wien, Gußhausstraße 27-29, 1040 Vienna, Austria.

Ulrike Diebold (U)

Institute of Applied Physics, TU Wien, Wiedner Hauptstraße 8-10, 1040 Vienna, Austria.

Andras Kis (A)

Institute of Electrical and Microengineering, École Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland.
Institute of Materials Science and Engineering, École Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland.

Zdeněk Sofer (Z)

Department of Inorganic Chemistry, University of Chemistry and Technology Prague, Technicka 5, 166 28, Prague 6, Czech Republic.

Classifications MeSH