High-κ Wide-Gap Layered Dielectric for Two-Dimensional van der Waals Heterostructures.
crystal synthesis
dielectric
excitons
field-effect transistors
heterostructures
high-k
two-dimensional materials
Journal
ACS nano
ISSN: 1936-086X
Titre abrégé: ACS Nano
Pays: United States
ID NLM: 101313589
Informations de publication
Date de publication:
16 Apr 2024
16 Apr 2024
Historique:
medline:
1
4
2024
pubmed:
1
4
2024
entrez:
1
4
2024
Statut:
ppublish
Résumé
van der Waals heterostructures of two-dimensional materials have unveiled frontiers in condensed matter physics, unlocking unexplored possibilities in electronic and photonic device applications. However, the investigation of wide-gap, high-κ layered dielectrics for devices based on van der Waals structures has been relatively limited. In this work, we demonstrate an easily reproducible synthesis method for the rare-earth oxyhalide LaOBr, and we exfoliate it as a 2D layered material with a measured static dielectric constant of 9 and a wide bandgap of 5.3 eV. Furthermore, our research demonstrates that LaOBr can be used as a high-κ dielectric in van der Waals field-effect transistors with high performance and low interface defect concentrations. Additionally, it proves to be an attractive choice for electrical gating in excitonic devices based on 2D materials. Our work demonstrates the versatile realization and functionality of 2D systems with wide-gap and high-κ van der Waals dielectric environments.
Identifiants
pubmed: 38557003
doi: 10.1021/acsnano.3c10411
pmc: PMC11025129
doi:
Types de publication
Journal Article
Langues
eng
Sous-ensembles de citation
IM
Pagination
10397-10406Références
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