Photoionization and dissociative photoionization of acetaldehyde in the 10.0-13.7 eV range by synchrotron photoelectron photoion coincidence spectroscopy.

Acetaldehyde Dissociation mechanism Dissociative photoionization Ionization energies Photoelectron spectroscopy

Journal

Chemphyschem : a European journal of chemical physics and physical chemistry
ISSN: 1439-7641
Titre abrégé: Chemphyschem
Pays: Germany
ID NLM: 100954211

Informations de publication

Date de publication:
09 Apr 2024
Historique:
revised: 09 04 2024
received: 26 02 2024
accepted: 09 04 2024
medline: 10 4 2024
pubmed: 10 4 2024
entrez: 9 4 2024
Statut: aheadofprint

Résumé

Photoionization and dissociative photoionization of acetaldehyde (CH3CHO) in the 10.0‒13.7 eV energy range are studied by using synchrotron radiation double imaging photoelectron photoion coincidence spectroscopy (i2PEPICO). The X2A' and A2A" electronic states of CH3CHO+ as well as the Franck-Condon gap region between these two states have been populated with several vibrational sequences and assigned in the high-resolution slow photoelectron spectrum (SPES). The adiabatic ionization energies (AIEs) of the X2A' and A2A" states are measured at 10.228 ± 0.006 and 12.52 ± 0.05 eV, respectively. The present results show that the X2A' state is a stable state while the A2A" state is fully dissociative to produce CH3CO+, CHO+ and CH4+ fragment ions. The 0K appearance energies (AE0K) of CH3CO+ and CHO+ fragment ions are determined through the modeling of the breakdown diagram, i.e., AE0K(CH3CO+) = 10.89 ± 0.01 eV (including a reverse barrier of ~ 0.19 eV) and AE0K(CHO+) = 11.54 ± 0.05 eV. In addition, the dissociation mechanisms of CH3CHO+ including statistical dissociation, direct bond breaking and isomerization are discussed with the support of the calculated dissociation limits and transition state energies.

Identifiants

pubmed: 38594204
doi: 10.1002/cphc.202400208
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

e202400208

Informations de copyright

© 2024 Wiley‐VCH GmbH.

Auteurs

Xiangkun Wu (X)

Chinese Academy of Sciences Hefei Institutes of Physical Science, Anhui Institute of Optics and Fine Mechanics, CHINA.

Cuihong Zhang (C)

Chinese Academy of Sciences Hefei Institutes of Physical Science, Anhui Institute of Optics and Fine Mechanics, CHINA.

Xuejun Gu (X)

Chinese Academy of Sciences Hefei Institutes of Physical Science, Anhui Institute of Optics and Fine Mechanics, CHINA.

Christa Fittschen (C)

University of Lille, Physicochimie des Processus de Combustion et de l'Atmosphère, FRANCE.

Jean-Christophe Loison (JC)

University of Bordeaux, Institut des Sciences Moléculaires, FRANCE.

Madhusree Roy Chowdhury (MR)

Synchrotron SOLEIL, DESIRS, FRANCE.

Gustavo A Garcia (GA)

Synchrotron SOLEIL, DESIRS, FRANCE.

Laurent Nahon (L)

Synchrotron SOLEIL, DESIRS, FRANCE.

Xiaofeng Tang (X)

Hefei Institutes of Physical Science, Chinese Academy of Science, Anhui Institute of Optics and Fine Mechanics, Shushanhu Road 350, 230031, Hefei, CHINA.

Classifications MeSH