Imaging 3D chemistry at 1 nm resolution with fused multi-modal electron tomography.


Journal

Nature communications
ISSN: 2041-1723
Titre abrégé: Nat Commun
Pays: England
ID NLM: 101528555

Informations de publication

Date de publication:
26 Apr 2024
Historique:
received: 14 12 2023
accepted: 03 04 2024
medline: 27 4 2024
pubmed: 27 4 2024
entrez: 26 4 2024
Statut: epublish

Résumé

Measuring the three-dimensional (3D) distribution of chemistry in nanoscale matter is a longstanding challenge for metrological science. The inelastic scattering events required for 3D chemical imaging are too rare, requiring high beam exposure that destroys the specimen before an experiment is completed. Even larger doses are required to achieve high resolution. Thus, chemical mapping in 3D has been unachievable except at lower resolution with the most radiation-hard materials. Here, high-resolution 3D chemical imaging is achieved near or below one-nanometer resolution in an Au-Fe

Identifiants

pubmed: 38670945
doi: 10.1038/s41467-024-47558-0
pii: 10.1038/s41467-024-47558-0
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

3555

Informations de copyright

© 2024. The Author(s).

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Auteurs

Jonathan Schwartz (J)

Department of Materials Science and Engineering, University of Michigan, Ann Arbor, MI, USA.

Zichao Wendy Di (ZW)

Mathematics and Computer Science Division, Argonne National Laboratory, Lemont, IL, USA.

Yi Jiang (Y)

Advanced Photon Source Facility, Argonne National Laboratory, Lemont, IL, USA.

Jason Manassa (J)

Department of Materials Science and Engineering, University of Michigan, Ann Arbor, MI, USA.

Jacob Pietryga (J)

Department of Materials Science and Engineering, University of Michigan, Ann Arbor, MI, USA.
Department of Material Science and Engineering, Northwestern University, Evanston, IL, USA.

Yiwen Qian (Y)

Department of Materials Science and Engineering, University of California at Berkeley, Berkeley, CA, USA.

Min Gee Cho (MG)

Department of Materials Science and Engineering, University of California at Berkeley, Berkeley, CA, USA.
National Center for Electron Microscopy, Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, CA, USA.

Jonathan L Rowell (JL)

Department of Chemistry and Chemical Biology, Cornell University, Ithaca, NY, USA.

Huihuo Zheng (H)

Argonne Leadership Computing Facility, Argonne National Laboratory, Lemont, IL, USA.

Richard D Robinson (RD)

Department of Material Science and Engineering, Cornell University, Ithaca, NY, USA.
Kavli Institute at Cornell for Nanoscale Science, Cornell University, Ithaca, NY, USA.

Junsi Gu (J)

Dow Chemical Co., Collegeville, PA, USA.

Alexey Kirilin (A)

Dow Chemical Co., Terneuzen, the Netherlands.

Steve Rozeveld (S)

Dow Chemical Co., Midland, MI, USA.

Peter Ercius (P)

National Center for Electron Microscopy, Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, CA, USA.

Jeffrey A Fessler (JA)

Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, MI, USA.

Ting Xu (T)

Department of Materials Science and Engineering, University of California at Berkeley, Berkeley, CA, USA.
Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, CA, USA.

Mary Scott (M)

Department of Materials Science and Engineering, University of California at Berkeley, Berkeley, CA, USA. mary.scott@berkeley.edu.
National Center for Electron Microscopy, Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, CA, USA. mary.scott@berkeley.edu.

Robert Hovden (R)

Department of Materials Science and Engineering, University of Michigan, Ann Arbor, MI, USA. hovden@umich.edu.
Applied Physics Program, University of Michigan, Ann Arbor, MI, USA. hovden@umich.edu.

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