Restricting Conformational Space: A New Blueprint for Electrically Switchable Self-Assembled Monolayers.

conformation design dipolar switching memristor neuromorphic computing tunnel effect

Journal

Small (Weinheim an der Bergstrasse, Germany)
ISSN: 1613-6829
Titre abrégé: Small
Pays: Germany
ID NLM: 101235338

Informations de publication

Date de publication:
02 May 2024
Historique:
revised: 18 04 2024
received: 14 09 2023
medline: 3 5 2024
pubmed: 3 5 2024
entrez: 3 5 2024
Statut: aheadofprint

Résumé

Tunnel junctions comprising self-assembled monolayers (SAMs) from liquid crystal-inspired molecules show a pronounced hysteretic current-voltage response, due to electric field-driven dipole reorientation in the SAM. This renders these junctions attractive device candidates for emerging technologies such as in-memory and neuromorphic computing. Here, the novel molecular design, device fabrication, and characterization of such resistive switching devices with a largely improved performance, compared to the previously published work are reported. Those former devices suffer from a stochastic switching behavior limiting reliability, as well as from critically small read-out currents. The present progress is based on replacing Al/AlO

Identifiants

pubmed: 38698574
doi: 10.1002/smll.202308072
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

e2308072

Informations de copyright

© 2024 The Authors. Small published by Wiley‐VCH GmbH.

Références

R. Arshad, S. Zahmoor, M. A. Shah, A. Wahid, H. Yu, H. Green, IEEE Access. 2017, 5, 15667.
a) C. Mead, IEEE. 1990, 78, 1629;
b) R. Yang, H.‐M. Huang, X. Guo, Adv. Electron. Mater. 2019, 1900287.
L. M. Krauss, IEET Blog, http://edge.org/response‐detail/26163, (accessed: Nov 2022).
a) L. O. Chua, IEEE Trans. Circuit Theory. 1971, 18, 507;
b) D. B. Strukov, G. S. Snider, D. R. Stewart, R. S. Williams, Nature. 2008, 453, 80;
c) Z. Wang, H. Wu, G. W. Burr, C. S. Hwang, K. L. Wang, Q. Xia, J. J. Yang, Nat. Rev. Mater. 2020, 5, 173.
a) D. Ielmini, S. Ambrogio, Nanotechnology. 2019, 31, 092001;
b) S. H. Park, H. J. Lee, M. H. Park, J. Kim, H. W. Jang, J. Phys. D: Appl. Phys. 2024, 57, 253002.
D. V. Christensen, R. Dittmann, B. Linares‐Barranco, A. Sebastian, M. L. Gallo, A. Redaelli, S. Slesazeck, T. Mikolajick, S. Spiga, S. Menzel, I. Valov, G. Milano, C. Ricciardi, S.‐J. Liang, F. Miao, M. Lanza, T. J. Quill, S. T. Keene, A. Salleo, J. Grollier, D. Marković, A. Mizrahi, P. Yao, J. J. Yang, G. Indiveri, J. P. Strachan, S. Datta, E. Vianello, A. Valentian, J. Feldmann, et al., Neuromorph. Comput. Eng. 2022, 2, 022501.
S. Majumdar, H. Tan, Q. H. Qin, S. van Dijken, Adv. Electron. Mater. 2019, 5, 1800795.
X. Chen, M. Roemer, L. Yuan, W. Du, D. Thompson, E. del Barco, C. A. Nijhuis, Nat. Nanotechnol. 2017, 12, 797.
J. M. Dlugosch, H. Seim, A. Bora, T. Kamiyama, I. Lieberman, F. May, F. Müller‐Plathe, A. Nefedov, S. Prasad, S. Resch, K. Saller, C. Seim, M. Speckbacher, F. Voges, M. Tornow, P. Kirsch, ACS Appl. Mater. Interfaces. 2022, 14, 31044.
Gaussian 16, Revision C.01, M. J. Frisch, G. W. Trucks, H. B. Schlegel, G. E. Scuseria, M. A. Robb, J. R. Cheeseman, G. Scalmani, V. Barone, G. A. Petersson, H. Nakatsuji, X. Li, M. Caricato, A. V. Marenich, J. Bloino, B. G. Janesko, R. Gomperts, B. Mennucci, H. P. Hratchian, J. V. Ortiz, A. F. Izmaylov, J. L. Sonnenberg, D. Williams‐Young, F. Ding, F. Lipparini, F. Egidi, J. Goings, B. Peng, A. Petrone, T. Henderson, D. Ranasinghe, et al., Gaussian, Inc, Wallingford CT 2016.
a) M. Oki, in Topics in Stereochemistry, Vol. 14, (Eds.: E. L. Eliel, N. L. Allinger, S. H. Wilen), John Wiley & Sons, New York 1983, pp. 1–82;
b) E. Zojer, T. C. Taucher, O. T. Hofmann, Adv. Mater. Interfaces. 2019, 6, 1900581.
J. M. Dlugosch, D. Devendra, D. Chryssikos, S. Artmeier, M. Speckbacher, T. Kamiyama, M. Tornow, Proc. IEEE Conf. Nanotechnol. 2020, (July), 29–34, https://doi.org/10.1109/nano47656.2020.9183521.
S. S. Cheema, N. Shankar, C.‐H. Hsu, A. Datar, J. Bae, D. Kwon, S. Salahuddin, Adv. Electron. Mater. 2022, 8, 2100499.

Auteurs

Peer Kirsch (P)

Merck Electronics KGaA, Frankfurter Str. 250, D-64293, Darmstadt, Germany.
Institute of Materials Science, Technical University of Darmstadt, Peter-Grünberg-Str. 2D, D-64287, Darmstadt, Germany.
Freiburg Materials Research Center (FMF), Albert Ludwig University Freiburg, Stefan-Meier-Str. 21, D-79104, Freiburg, Germany.

Julian M Dlugosch (JM)

Molecular Electronics, Technical University of Munich, Hans-Piloty-Str. 1, D-85748, Garching, Germany.

Takuya Kamiyama (T)

Molecular Electronics, Technical University of Munich, Hans-Piloty-Str. 1, D-85748, Garching, Germany.

Christian Pfeiffer (C)

Molecular Electronics, Technical University of Munich, Hans-Piloty-Str. 1, D-85748, Garching, Germany.

Henning Seim (H)

Merck Electronics KGaA, Frankfurter Str. 250, D-64293, Darmstadt, Germany.

Sebastian Resch (S)

Merck Electronics KGaA, Frankfurter Str. 250, D-64293, Darmstadt, Germany.

Frank Voges (F)

Merck Electronics KGaA, Frankfurter Str. 250, D-64293, Darmstadt, Germany.

Itai Lieberman (I)

Merck Electronics KGaA, Frankfurter Str. 250, D-64293, Darmstadt, Germany.

Abin Nas Nalakath (AN)

Institute of Materials Science, Technical University of Darmstadt, Peter-Grünberg-Str. 2D, D-64287, Darmstadt, Germany.

Yangbiao Liu (Y)

Angewandte Physikalische Chemie, Heidelberg University, Im Neuenheimer Feld 253, D-69120, Heidelberg, Germany.

Michael Zharnikov (M)

Angewandte Physikalische Chemie, Heidelberg University, Im Neuenheimer Feld 253, D-69120, Heidelberg, Germany.

Marc Tornow (M)

Molecular Electronics, Technical University of Munich, Hans-Piloty-Str. 1, D-85748, Garching, Germany.
Fraunhofer Institute for Electronic Microsystems and Solid State Technologies (EMFT), Hansastr. 27d, D-80686, Munich, Germany.

Classifications MeSH