Measuring Electrical Resistivity at the Nanoscale in Phase-Change Materials.

electrical resistivity electron holography finite element modeling in situ TEM operando experiments phase-change materials

Journal

Nano letters
ISSN: 1530-6992
Titre abrégé: Nano Lett
Pays: United States
ID NLM: 101088070

Informations de publication

Date de publication:
06 May 2024
Historique:
medline: 6 5 2024
pubmed: 6 5 2024
entrez: 6 5 2024
Statut: aheadofprint

Résumé

Electrical resistivity is the key parameter in the active regions of many current nanoscale devices, from memristors to resistive random-access memory and phase-change memories. The local resistivity of the materials is engineered on the nanoscale to fit the performance requirements. Phase-change memories, for example, rely on materials whose electrical resistance increases dramatically with a change from a crystalline to an amorphous phase. Electrical characterization methods have been developed to measure the response of individual devices, but they cannot map the local resistance across the active area. Here, we propose a method based on

Identifiants

pubmed: 38710045
doi: 10.1021/acs.nanolett.4c01462
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Auteurs

Leifeng Zhang (L)

CEMES-CNRS, Université Paul Sabatier, 29 rue Jeanne Marvig, 31055 Toulouse, France.

Frédéric Lorut (F)

STMicroelectronics, 820 rue Jean Monnet, 38920 Crolles, France.

Kilian Gruel (K)

CEMES-CNRS, Université Paul Sabatier, 29 rue Jeanne Marvig, 31055 Toulouse, France.

Martin J Hÿtch (MJ)

CEMES-CNRS, Université Paul Sabatier, 29 rue Jeanne Marvig, 31055 Toulouse, France.

Christophe Gatel (C)

CEMES-CNRS, Université Paul Sabatier, 29 rue Jeanne Marvig, 31055 Toulouse, France.

Classifications MeSH