Enhanced Far-Field Thermal Radiation through a Polaritonic Waveguide.


Journal

Physical review letters
ISSN: 1079-7114
Titre abrégé: Phys Rev Lett
Pays: United States
ID NLM: 0401141

Informations de publication

Date de publication:
03 May 2024
Historique:
received: 18 11 2023
revised: 03 02 2024
accepted: 13 03 2024
medline: 17 5 2024
pubmed: 17 5 2024
entrez: 17 5 2024
Statut: ppublish

Résumé

We experimentally demonstrate the enhancement of the far-field thermal radiation between two nonabsorbent Si microplates coated with energy-absorbent silicon dioxide (SiO_{2}) nanolayers supporting the propagation of surface phonon polaritons. By measuring the radiative thermal conductance between two coated Si plates, we find that its values are twice those obtained without the SiO_{2} coating. This twofold increase results from the hybridization of polaritons with guided modes inside Si and is well predicted by fluctuational electrodynamics and an analytical model based on a two-dimensional density of polariton states. These findings could be applied to thermal management in microelectronics, silicon photonics, energy conversion, atmospheric sciences, and astrophysics.

Identifiants

pubmed: 38759170
doi: 10.1103/PhysRevLett.132.186904
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

186904

Auteurs

Saeko Tachikawa (S)

Institute of Industrial Science, The University of Tokyo, Tokyo 153-8505, Japan.
Research Center for Advanced Science and Technology, The University of Tokyo, Tokyo 153-8505, Japan.

Jose Ordonez-Miranda (J)

Institute of Industrial Science, The University of Tokyo, Tokyo 153-8505, Japan.
LIMMS, CNRS-IIS IRL 2820, The University of Tokyo, Tokyo 153-8505, Japan.

Laurent Jalabert (L)

Institute of Industrial Science, The University of Tokyo, Tokyo 153-8505, Japan.
LIMMS, CNRS-IIS IRL 2820, The University of Tokyo, Tokyo 153-8505, Japan.

Yunhui Wu (Y)

Institute of Industrial Science, The University of Tokyo, Tokyo 153-8505, Japan.

Roman Anufriev (R)

Institute of Industrial Science, The University of Tokyo, Tokyo 153-8505, Japan.
Univ. Lyon, INSA Lyon, CNRS, CETHIL, UMR5008, 69621 Villeurbanne, France.

Yangyu Guo (Y)

Institute of Industrial Science, The University of Tokyo, Tokyo 153-8505, Japan.

Byunggi Kim (B)

Institute of Industrial Science, The University of Tokyo, Tokyo 153-8505, Japan.

Hiroyuki Fujita (H)

Institute of Industrial Science, The University of Tokyo, Tokyo 153-8505, Japan.
LIMMS, CNRS-IIS IRL 2820, The University of Tokyo, Tokyo 153-8505, Japan.

Sebastian Volz (S)

Institute of Industrial Science, The University of Tokyo, Tokyo 153-8505, Japan.
LIMMS, CNRS-IIS IRL 2820, The University of Tokyo, Tokyo 153-8505, Japan.

Masahiro Nomura (M)

Institute of Industrial Science, The University of Tokyo, Tokyo 153-8505, Japan.
Research Center for Advanced Science and Technology, The University of Tokyo, Tokyo 153-8505, Japan.
LIMMS, CNRS-IIS IRL 2820, The University of Tokyo, Tokyo 153-8505, Japan.

Classifications MeSH