Intrinsically Stretchable Floating Gate Memory Transistors for Data Storage of Electronic Skin Devices.

electronic skin floating gate device organic memory transistor stretchable transistor wearable device write once read many

Journal

ACS nano
ISSN: 1936-086X
Titre abrégé: ACS Nano
Pays: United States
ID NLM: 101313589

Informations de publication

Date de publication:
18 May 2024
Historique:
medline: 18 5 2024
pubmed: 18 5 2024
entrez: 18 5 2024
Statut: aheadofprint

Résumé

To propel electronic skin (e-skin) to the next level by integrating artificial intelligence features with advanced sensory capabilities, it is imperative to develop stretchable memory device technology. A stretchable memory device for e-skin must offer, in particular, long-term data storage while ensuring the security of personal information under any type of deformation. However, despite the significance of these needs, technology related to stretchable memory devices remains in its infancy. Here, we report an intrinsically stretchable floating gate (FG) polymer memory transistor. The device features a dual-stimuli (optical and electrical) writing system to prevent easy erasure of recorded data. An FG comprising an intermixture of Ag nanoparticles and elastomer and with proper energy-band alignment between the semiconductor and dielectric facilitated sustainable memory performance, while achieving a high memory on/off ratio (>10

Identifiants

pubmed: 38761154
doi: 10.1021/acsnano.4c02303
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Auteurs

Tae Uk Nam (TU)

Department of Chemical Engineering (Integrated Engineering Program), Kyung Hee University, Yongin, Gyeonggi 17104, Korea.

Ngoc Thanh Phuong Vo (NTP)

Department of Chemical Engineering (Integrated Engineering Program), Kyung Hee University, Yongin, Gyeonggi 17104, Korea.

Min Woo Jeong (MW)

Department of Chemical Engineering (Integrated Engineering Program), Kyung Hee University, Yongin, Gyeonggi 17104, Korea.

Kyu Ho Jung (KH)

Department of Chemical Engineering (Integrated Engineering Program), Kyung Hee University, Yongin, Gyeonggi 17104, Korea.

Seung Hwan Lee (SH)

Department of Electronics Engineering, Kyung Hee University, Yongin, Gyeonggi 17104, Korea.

Tae Il Lee (TI)

Department of Materials Science and Engineering, Gachon University, Seong-nam, Gyeonggi 13120, Korea.

Jin Young Oh (JY)

Department of Chemical Engineering (Integrated Engineering Program), Kyung Hee University, Yongin, Gyeonggi 17104, Korea.

Classifications MeSH