Experimental Study of the Implantation Process for Array Electrodes into Highly Transparent Agarose Gel.

array electrode digital gradient sensing implantation process stress state

Journal

Materials (Basel, Switzerland)
ISSN: 1996-1944
Titre abrégé: Materials (Basel)
Pays: Switzerland
ID NLM: 101555929

Informations de publication

Date de publication:
14 May 2024
Historique:
received: 08 04 2024
revised: 09 05 2024
accepted: 11 05 2024
medline: 25 5 2024
pubmed: 25 5 2024
entrez: 25 5 2024
Statut: epublish

Résumé

Brain-computer interface (BCI) technology is currently a cutting-edge exploratory problem in the field of human-computer interaction. However, in experiments involving the implantation of electrodes into brain tissue, particularly high-speed or array implants, existing technologies find it challenging to observe the damage in real time. Considering the difficulties in obtaining biological brain tissue and the challenges associated with real-time observation of damage during the implantation process, we have prepared a transparent agarose gel that closely mimics the mechanical properties of biological brain tissue for use in electrode implantation experiments. Subsequently, we developed an experimental setup for synchronized observation of the electrode implantation process, utilizing the Digital Gradient Sensing (DGS) method. In the single electrode implantation experiments, with the increase in implantation speed, the implantation load increases progressively, and the tissue damage region around the electrode tip gradually diminishes. In the array electrode implantation experiments, compared to a single electrode, the degree of tissue indentation is more severe due to the coupling effect between adjacent electrodes. As the array spacing increases, the coupling effect gradually diminishes. The experimental results indicate that appropriately increasing the velocity and array spacing of the electrodes can enhance the likelihood of successful implantation. The research findings of this article provide valuable guidance for the damage assessment and selection of implantation parameters during the process of electrode implantation into real brain tissue.

Identifiants

pubmed: 38793401
pii: ma17102334
doi: 10.3390/ma17102334
pii:
doi:

Types de publication

Journal Article

Langues

eng

Auteurs

Shengjie Wang (S)

Beijing Key Laboratory of Lightweight Multi-Functional Composite Materials and Structures, Institute of Advanced Structure Technology, Beijing Institute of Technology, Beijing 100081, China.

Xuan Yan (X)

Beijing Key Laboratory of Lightweight Multi-Functional Composite Materials and Structures, Institute of Advanced Structure Technology, Beijing Institute of Technology, Beijing 100081, China.

Xuefeng Jiao (X)

Beijing Key Laboratory of Lightweight Multi-Functional Composite Materials and Structures, Institute of Advanced Structure Technology, Beijing Institute of Technology, Beijing 100081, China.

Heng Yang (H)

Beijing Key Laboratory of Lightweight Multi-Functional Composite Materials and Structures, Institute of Advanced Structure Technology, Beijing Institute of Technology, Beijing 100081, China.

Classifications MeSH