Urocanic acid as a novel scaffold for next-gen nature-inspired sunscreens: I. electronic laser spectroscopy under isolated conditions.


Journal

Physical chemistry chemical physics : PCCP
ISSN: 1463-9084
Titre abrégé: Phys Chem Chem Phys
Pays: England
ID NLM: 100888160

Informations de publication

Date de publication:
15 Jul 2024
Historique:
medline: 15 7 2024
pubmed: 15 7 2024
entrez: 15 7 2024
Statut: aheadofprint

Résumé

Urocanic acid is a naturally occurring UV-A and UV-B absorbing compound found in the skin. Its use in artificial sunscreens has been abandoned because of health risks associated with the

Identifiants

pubmed: 39007338
doi: 10.1039/d4cp02087a
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Auteurs

Jiayun Fan (J)

Van't Hoff Institute for Molecular Sciences, University of Amsterdam, Science Park 904, 1098 XH Amsterdam, The Netherlands. w.j.buma@uva.nl.

Alexander K Lemmens (AK)

Van't Hoff Institute for Molecular Sciences, University of Amsterdam, Science Park 904, 1098 XH Amsterdam, The Netherlands. w.j.buma@uva.nl.
Institute for Molecules and Materials, Radboud University, Toernooiveld 7c, 6525 ED Nijmegen, The Netherlands.

Hans Sanders (H)

Van't Hoff Institute for Molecular Sciences, University of Amsterdam, Science Park 904, 1098 XH Amsterdam, The Netherlands. w.j.buma@uva.nl.

Michiel Hilbers (M)

Van't Hoff Institute for Molecular Sciences, University of Amsterdam, Science Park 904, 1098 XH Amsterdam, The Netherlands. w.j.buma@uva.nl.

Wim Roeterdink (W)

Van't Hoff Institute for Molecular Sciences, University of Amsterdam, Science Park 904, 1098 XH Amsterdam, The Netherlands. w.j.buma@uva.nl.

Wybren Jan Buma (W)

Van't Hoff Institute for Molecular Sciences, University of Amsterdam, Science Park 904, 1098 XH Amsterdam, The Netherlands. w.j.buma@uva.nl.
Institute for Molecules and Materials, Radboud University, Toernooiveld 7c, 6525 ED Nijmegen, The Netherlands.

Classifications MeSH