Rubidium and Cesium Ion-Induced Electron and Ion Signals for Scanning Ion Microscopy Applications.

alkali metal ions focused ion beam scanning ion microscopy

Journal

Microscopy and microanalysis : the official journal of Microscopy Society of America, Microbeam Analysis Society, Microscopical Society of Canada
ISSN: 1435-8115
Titre abrégé: Microsc Microanal
Pays: England
ID NLM: 9712707

Informations de publication

Date de publication:
10 Sep 2024
Historique:
received: 15 05 2024
revised: 26 07 2024
accepted: 20 08 2024
medline: 10 9 2024
pubmed: 10 9 2024
entrez: 10 9 2024
Statut: aheadofprint

Résumé

Scanning ion microscopy applications of novel focused ion beam (FIB) systems based on ultracold rubidium (Rb) and cesium (Cs) atoms were investigated via ion-induced electron and ion yields. Results measured on the Rb+ and Cs+ FIB systems were compared with results from commercially available gallium (Ga+) FIB systems to verify the merits of applying Rb+ and Cs+ for imaging. The comparison shows that Rb+ and Cs+ have higher secondary electron (SE) yields on a variety of pure element targets than Ga+, which implies a higher signal-to-noise ratio can be achieved for the same dose in SE imaging using Rb+/Cs+ than Ga+. In addition, analysis of the ion-induced ion signals reveals that secondary ions dominate Cs+ induced ion signals while the Rb+/Ga+ induced signals contain more backscattered ions.

Identifiants

pubmed: 39255067
pii: 7754544
doi: 10.1093/mam/ozae087
pii:
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Subventions

Organisme : Next-Generation Focused Ion Beam
ID : NWO-TTW16178
Organisme : Applied and Engineering Sciences (TTW)
Organisme : Dutch Research Council (NWO)

Informations de copyright

© The Author(s) 2024. Published by Oxford University Press on behalf of the Microscopy Society of America. All rights reserved. For commercial re-use, please contact reprints@oup.com for reprints and translation rights for reprints. All other permissions can be obtained through our RightsLink service via the Permissions link on the article page on our site—for further information please contact journals.permissions@oup.com.

Déclaration de conflit d'intérêts

Conflict of Interest The authors have no conflicts to disclose.

Auteurs

Yang Li (Y)

Department of Applied Physics and Science Education, Eindhoven University of Technology (TU/e), P.O. Box 513, Eindhoven 5600 MB, The Netherlands.

Sheng Xu (S)

Department of Applied Physics and Science Education, Eindhoven University of Technology (TU/e), P.O. Box 513, Eindhoven 5600 MB, The Netherlands.
College of Engineering and Applied Sciences (CEAS), Nanjing University, 163 Xianlin Avenue, Nanjing 210023, China.

Thomas H Loeber (TH)

Nano Structuring Center (NSC), Rheinland-Pfälzische Technische Universität Kaiserslautern-Landau (RPTU), P.O. Box 3049, Kaiserslautern D-67653, Germany.

Edgar J D Vredenbregt (EJD)

Department of Applied Physics and Science Education, Eindhoven University of Technology (TU/e), P.O. Box 513, Eindhoven 5600 MB, The Netherlands.

Classifications MeSH