Electron Collimation in Twisted Bilayer Graphene via Gate-Defined Moiré Barriers.

Band-Insulator Gap Electron Collimation Gate-Defined Junction Moiré Barrier Twisted Bilayer Graphene

Journal

Nano letters
ISSN: 1530-6992
Titre abrégé: Nano Lett
Pays: United States
ID NLM: 101088070

Informations de publication

Date de publication:
24 Sep 2024
Historique:
medline: 24 9 2024
pubmed: 24 9 2024
entrez: 24 9 2024
Statut: aheadofprint

Résumé

Electron collimation via a graphene p-n junction allows electrostatic control of ballistic electron trajectories akin to that of an optical circuit. Similar manipulation of novel correlated electronic phases in twisted-bilayer graphene (tBLG) can provide additional probes to the underlying physics and device components toward advanced quantum electronics. In this work, we demonstrate collimation of the electron flow via gate-defined moiré barriers in a tBLG device, utilizing the band-insulator gap of the moiré superlattice. A single junction can be tuned to host a chosen combination of conventional pseudo barrier and moiré tunnel barriers, from which we demonstrate improved collimation efficiency. By measuring transport through two consecutive moiré collimators separated by 1 μm, we demonstrate evidence of electron collimation in tBLG in the presence of realistic twist-angle inhomogeneity.

Identifiants

pubmed: 39316821
doi: 10.1021/acs.nanolett.4c03373
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Auteurs

Wei Ren (W)

School of Physics and Astronomy, University of Minnesota, Minneapolis, Minnesota 55455, United States.

Xi Zhang (X)

School of Physics and Astronomy, University of Minnesota, Minneapolis, Minnesota 55455, United States.

Ziyan Zhu (Z)

Stanford Institute for Materials and Energy Sciences, SLAC National Accelerator Laboratory, Menlo Park, California 94025, United States.

Moosa Khan (M)

School of Physics and Astronomy, University of Minnesota, Minneapolis, Minnesota 55455, United States.

Kenji Watanabe (K)

Research Center for Electronic and Optical Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan.

Takashi Taniguchi (T)

Research Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan.

Efthimios Kaxiras (E)

Department of Physics, Harvard University, Cambridge, Massachusetts 02138, United States.
John A. Paulson School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138, United States.

Mitchell Luskin (M)

School of Mathematics, University of Minnesota, Minneapolis, Minnesota 55455, United States.

Ke Wang (K)

School of Physics and Astronomy, University of Minnesota, Minneapolis, Minnesota 55455, United States.

Classifications MeSH