A non-linear analysis of Turing pattern formation.


Journal

PloS one
ISSN: 1932-6203
Titre abrégé: PLoS One
Pays: United States
ID NLM: 101285081

Informations de publication

Date de publication:
2019
Historique:
received: 08 06 2019
accepted: 28 07 2019
entrez: 10 8 2019
pubmed: 10 8 2019
medline: 4 3 2020
Statut: epublish

Résumé

Reaction-diffusion schemes are widely used to model and interpret phenomena in various fields. In that context, phenomena driven by Turing instabilities are particularly relevant to describe patterning in a number of biological processes. While the conditions that determine the appearance of Turing patterns and their wavelength can be easily obtained by a linear stability analysis, the estimation of pattern amplitudes requires cumbersome calculations due to non-linear terms. Here we introduce an expansion method that makes possible to obtain analytical, approximated, solutions of the pattern amplitudes. We check and illustrate the reliability of this methodology with results obtained from numerical simulations.

Identifiants

pubmed: 31398237
doi: 10.1371/journal.pone.0220994
pii: PONE-D-19-15533
pmc: PMC6688798
doi:

Types de publication

Journal Article Research Support, N.I.H., Extramural

Langues

eng

Sous-ensembles de citation

IM

Pagination

e0220994

Subventions

Organisme : NIGMS NIH HHS
ID : R15 GM123422
Pays : United States

Déclaration de conflit d'intérêts

The authors have declared that no competing interests exist.

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Auteurs

Yanyan Chen (Y)

Department of Bioengineering, Lehigh University, Iacocca Hall, Bethlehem, Pennsylvania, United States of America.

Javier Buceta (J)

Department of Bioengineering, Lehigh University, Iacocca Hall, Bethlehem, Pennsylvania, United States of America.
Department of Chemical and Biomolecular Engineering, Lehigh University, Iacocca Hall, Bethlehem, Pennsylvania, United States of America.

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Classifications MeSH