Simple and Scalable Chemical Surface Patterning via Direct Deposition from Immobilized Plasma Filaments in a Dielectric Barrier Discharge.
X-ray photoelectron spectroscopy
atmospheric plasmas
patterned surfaces
streamers
Journal
Advanced science (Weinheim, Baden-Wurttemberg, Germany)
ISSN: 2198-3844
Titre abrégé: Adv Sci (Weinh)
Pays: Germany
ID NLM: 101664569
Informations de publication
Date de publication:
05 2022
05 2022
Historique:
revised:
10
03
2022
received:
10
02
2022
pubmed:
29
3
2022
medline:
27
5
2022
entrez:
28
3
2022
Statut:
ppublish
Résumé
In this work, immobilization of the often unwanted filaments in dielectric barrier discharges (DBD) is achieved and used for one-step deposition of patterned coatings. By texturing one of the dielectric surfaces, a discharge containing stationary plasma filaments is ignited in a mix of argon and propargyl methacrylate (PMA) in a reactor operating at atmospheric pressure. From PMA, hydrophobic and hydrophilic chemical and topographical contrasts at sub-millimeter scale are obtained on silicon and glass substrates. Chemical and physical characterizations of the samples are performed by micrometer-scale X-ray photoelectron spectroscopy and infrared imaging and by water contact angle and profilometry, respectively. From the latter and additional information from high-speed imaging of the plasma phase and electrical measurements, it is suggested that filaments, denser in energetic species, lead to higher deposition rate with higher fragmentation of the precursor, while surface discharges igniting outwards the filaments are leading to smoother and slower deposition. This work opens a new route for a one-step large-area chemical and morphological patterning of surfaces at sub-millimeter scales. Moreover, the possibility to separately deposit coatings from filaments and the surrounding plasma phase can be helpful to better understand the processes occurring during plasma polymerization in filamentary DBD.
Identifiants
pubmed: 35343108
doi: 10.1002/advs.202200237
pmc: PMC9130873
doi:
Substances chimiques
Plasma Gases
0
Argon
67XQY1V3KH
Types de publication
Journal Article
Research Support, Non-U.S. Gov't
Langues
eng
Sous-ensembles de citation
IM
Pagination
e2200237Subventions
Organisme : National Fund for Scientific Research (F.R.S-F.N.R.S)
Organisme : Fonds Wetenschappelijk Onderzoek
Organisme : Instream project, Nitroplasm and PlaSyntH2 projects
Organisme : Excellence of Science (EOS) program
Organisme : Fondation Universitaire de Belgique
Informations de copyright
© 2022 The Authors. Advanced Science published by Wiley-VCH GmbH.
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