Geometric Tuning of Stress in Predisplaced Silicon Nitride Resonators.

Equipment Design Microscopy, Electron, Scanning Silicon Compounds
dissipation optomechanics quality factor silicon nitride stress string

Journal

Nano letters
ISSN: 1530-6992
Titre abrégé: Nano Lett
Pays: United States
ID NLM: 101088070

Informations de publication

Date de publication:
25 05 2022
Historique:
pubmed: 6 5 2022
medline: 27 5 2022
entrez: 5 5 2022
Statut: ppublish

Résumé

We introduce a novel method to geometrically tune the tension in prestrained resonators by making Si

Identifiants

DOI: 10.1021/acs.nanolett.2c00613 PMID: 35510870
pubmed: 35510870
doi: 10.1021/acs.nanolett.2c00613
doi:

Substances chimiques

Silicon Compounds 0
silicon nitride QHB8T06IDK

Types de publication

Journal Article Research Support, Non-U.S. Gov't

Langues

eng

Sous-ensembles de citation

IM

Pagination

4013-4019

Auteurs

David Hoch (D)

Department of Physics, Technical University Munich, Garching 85748, Germany.
Munich Center for Quantum Science and Technology (MCQST), Munich, 80799, Germany.
Institute for Advanced Study, Technical University Munich, Garching, 85748, Germany.

Xiong Yao (X)

Department of Physics, Technical University Munich, Garching 85748, Germany.

Menno Poot (M)

Department of Physics, Technical University Munich, Garching 85748, Germany.
Munich Center for Quantum Science and Technology (MCQST), Munich, 80799, Germany.
Institute for Advanced Study, Technical University Munich, Garching, 85748, Germany.
ORCID: 0000-0002-5047-8497

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Classifications MeSH

questionsmedicales.fr › Techniques d'investigation › Conception d'appareillage › Geometric Tuning of Stress in Predisplaced...
questionsmedicales.fr › Techniques d'investigation › Microscopie électronique › Microscopie électronique à balayage › Geometric Tuning of Stress in Predisplaced...
questionsmedicales.fr › Produits chimiques inorganiques › Composés du silicium › Geometric Tuning of Stress in Predisplaced...