Robust Bottom-Up Gold Filling of Deep Trenches and Gratings.

Electroplating Gold Gratings Superconformal

Journal

Journal of the Electrochemical Society
ISSN: 0013-4651
Titre abrégé: J Electrochem Soc
Pays: England
ID NLM: 7505603

Informations de publication

Date de publication:
2022
Historique:
entrez: 20 3 2023
pubmed: 1 1 2022
medline: 1 1 2022
Statut: ppublish

Résumé

This work extends an extreme variant of superconformal Au electrodeposition to deeper device architectures while exploring factors that constrain its function and the robustness of void-free processing. The unconventional bottom-up process is used to fill diffraction gratings with trenches 94 μm deep and 305 μm deep, with aspect ratios (height/width) of just below 20 and 15, respectively, in near-neutral 0.16 mol·L

Identifiants

pubmed: 36936547
doi: 10.1149/1945-7111/ac5c0b
pmc: PMC10020987
mid: NIHMS1874088
doi:

Types de publication

Journal Article

Langues

eng

Subventions

Organisme : Intramural NIST DOC
ID : 9999-NIST
Pays : United States

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Auteurs

D Josell (D)

Materials Science and Engineering Division, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA.

W Osborn (W)

Materials Measurement Science Division, National Institute of Standards and Technology, Gaithersburg, Maryland, 20899, USA.

M E Williams (ME)

Materials Science and Engineering Division, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA.

H Miao (H)

General Optics, LLC, Zionsville, IN 46077.

Classifications MeSH