Bottom-Up Gold Filling in New Geometries and Yet Higher Aspect Ratio Gratings for Hard X-Ray Interferometry.

Electroplating Talbot interferometer X-ray optics X-ray wave front sensing chessboard gratings deep reactive ion etching

Journal

Journal of the Electrochemical Society
ISSN: 0013-4651
Titre abrégé: J Electrochem Soc
Pays: England
ID NLM: 7505603

Informations de publication

Date de publication:
2021
Historique:
entrez: 20 3 2023
pubmed: 1 1 2021
medline: 1 1 2021
Statut: ppublish

Résumé

An extreme bottom-up filling variant of superconformal Au electrodeposition yielding void-free filling of recessed features is demonstrated with diffraction gratings composed of a two-dimensional patterned "chessboard" array of square vias of aspect ratio (depth/width) ≈ 23 as well as one-dimensional arrays of trenches having aspect ratios exceeding 50 and 65. Deposition on planar and patterned substrates is examined in several near-neutral x mol·L

Identifiants

pubmed: 36938320
doi: 10.1149/1945-7111/ac1d7e
pmc: PMC10020954
mid: NIHMS1874086
doi:

Types de publication

Journal Article

Langues

eng

Subventions

Organisme : Intramural NIST DOC
ID : 9999-NIST
Pays : United States

Références

Nat Commun. 2012 Jul 10;3:947
pubmed: 22781760
J Electrochem Soc. 2017;164(6):D327-D334
pubmed: 28729743
Opt Express. 2005 Aug 8;13(16):6296-304
pubmed: 19498642
J Electrochem Soc. 2019;166(16):
pubmed: 33041357
Micromachines (Basel). 2021 May 07;12(5):
pubmed: 34066906
Phys Rev Lett. 2010 Dec 10;105(24):248102
pubmed: 21231558
Eur Radiol. 2020 Mar;30(3):1419-1425
pubmed: 31440834
Philos Trans A Math Phys Eng Sci. 2014 Jan 27;372(2010):20130027
pubmed: 24470411
Micromachines (Basel). 2020 Sep 18;11(9):
pubmed: 32961900
Opt Express. 2021 Jan 18;29(2):2049-2064
pubmed: 33726406
Nanoscale Horiz. 2020 May 1;5(5):869-879
pubmed: 32100775
J Electrochem Soc. 2019;166(12):
pubmed: 33041356
Sci Rep. 2019 Jun 18;9(1):8699
pubmed: 31213645

Auteurs

D Josell (D)

Materials Science and Engineering Division, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA.

Z Shi (Z)

Paul Scherrer Institut, 5232 Villigen PSI, Switzerland.
Institute for Biomedical Engineering, University and ETH Zürich, Zürich 8092, Switzerland.

K Jefimovs (K)

Paul Scherrer Institut, 5232 Villigen PSI, Switzerland.
Institute for Biomedical Engineering, University and ETH Zürich, Zürich 8092, Switzerland.

V Guzenko (V)

Paul Scherrer Institut, 5232 Villigen PSI, Switzerland.

C Beauchamp (C)

Materials Science and Engineering Division, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA.

L Peer (L)

Paul Scherrer Institut, 5232 Villigen PSI, Switzerland.
Institute for Biomedical Engineering, University and ETH Zürich, Zürich 8092, Switzerland.

M Polikarpov (M)

Paul Scherrer Institut, 5232 Villigen PSI, Switzerland.
Institute for Biomedical Engineering, University and ETH Zürich, Zürich 8092, Switzerland.

T P Moffat (TP)

Materials Science and Engineering Division, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA.

Classifications MeSH