Genome wide association analysis of cuticle deposition in laying hens.
candidate genes
egg quality
genetics
vertical transmission
zoonoses
Journal
Poultry science
ISSN: 1525-3171
Titre abrégé: Poult Sci
Pays: England
ID NLM: 0401150
Informations de publication
Date de publication:
Oct 2023
Oct 2023
Historique:
received:
25
05
2023
revised:
24
07
2023
accepted:
28
07
2023
medline:
27
9
2023
pubmed:
21
8
2023
entrez:
20
8
2023
Statut:
ppublish
Résumé
The cuticle is an invisible barrier that protects the internal egg contents from microorganisms entering through gas exchange pores. Eggs which have a good cuticle are least likely to be penetrated by microorganisms and improved cuticle cover should reduce vertical transmission of microorganisms and improve biosecurity. The aim was to carry out a genome wide association study for cuticle deposition in 3 independent populations of laying hens using tartrazine and lissamine green staining. Eggs from ∼8,000 hens represented 2 White Leghorn and 1 Rhode Island Red breed. Estimates of heritability using pedigree or genomic relationship matrices were in the 0.2 to 0.3 range. The results were breed specific. Across the populations, genomic regions on chromosomes 1, 2, 4, 5, and 8 were identified as significantly associated with cuticle deposition. No single loci had a large effect. A comparison was made with genes differentially expressed in the shell gland when cuticle deposition was manipulated, however none were obvious candidates for cuticle deposition. The results support the polygenic nature of the trait and the information will help in the future to understand the genetic variance and what might control cuticle deposition and the microbiological safety of the egg.
Identifiants
pubmed: 37598557
pii: S0032-5791(23)00509-6
doi: 10.1016/j.psj.2023.102990
pmc: PMC10458670
pii:
doi:
Types de publication
Journal Article
Langues
eng
Sous-ensembles de citation
IM
Pagination
102990Informations de copyright
Copyright © 2023 The Authors. Published by Elsevier Inc. All rights reserved.