Comparison of the acceptable surface limits derived from the skin sensitization potency for workers and swab residue limits determined from the permitted daily exposure derived from the systemic effects.

Acceptable surface limits HBEL LLNA: BrdU-ELISA Skin sensitization

Journal

The Journal of toxicological sciences
ISSN: 1880-3989
Titre abrégé: J Toxicol Sci
Pays: Japan
ID NLM: 7805798

Informations de publication

Date de publication:
2023
Historique:
medline: 5 9 2023
pubmed: 4 9 2023
entrez: 4 9 2023
Statut: ppublish

Résumé

Allergic contact dermatitis is a common occupational and environmental health problem and setting of health-based exposure limits (HBELs) to prevent induction of skin sensitization is strongly desired. When manufacturing pharmaceuticals in a shared facility, cleaning validation using surface residue levels (SRLs) derived from permitted daily exposures (PDEs) is conducted to avoid cross-contamination from the perspective of protecting patients; however, it is unclear whether the SRLs are sufficient to prevent induction of skin sensitization for workers as well. In this study, we compared acceptable surface limits (ASLs) derived from acceptable exposure levels (AELs) based on EC1.6 obtained from local lymph node assay (LLNA): BrdU-ELISA for occupational risk management of skin sensitizers with PDE-based SRLs. ASLs for 1,4-phenylenediamine (GHS skin sensitization sub-category 1A), isoeugenol (sub-category 1A), and methyl methacrylate (sub-category 1B) were compared with SRLs based on the PDEs derived from their systemic effects. The results yielded an SRL for 1,4-phenylenediamine (PDE: 0.8 mg/day) of 30 mg/100 cm

Identifiants

pubmed: 37661367
doi: 10.2131/jts.48.507
doi:

Substances chimiques

4-phenylenediamine U770QIT64J
diethylstilbestrol monophosphate 47341-71-9
isoeugenol 5M0MWY797U
Methylmethacrylate 196OC77688
Methacrylates 0

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

507-511

Auteurs

Asako Fukushima (A)

Chemicals Assessment and Research Center, Chemicals Evaluation and Research Institute.

Tae Hayashi (T)

Chemicals Assessment and Research Center, Chemicals Evaluation and Research Institute.

Masahiro Takeyoshi (M)

Chemicals Assessment and Research Center, Chemicals Evaluation and Research Institute.

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Classifications MeSH